Materials Processing by Cluster Ion Beams: History, Technology, and Applications
暫譯: 集群離子束材料加工:歷史、技術與應用

Isao Yamada

  • 出版商: CRC
  • 出版日期: 2015-08-20
  • 售價: $7,140
  • 貴賓價: 9.5$6,783
  • 語言: 英文
  • 頁數: 260
  • 裝訂: Hardcover
  • ISBN: 1498711758
  • ISBN-13: 9781498711753
  • 海外代購書籍(需單獨結帳)

商品描述

Materials Processing by Cluster Ion Beams: History, Technology, and Applications discusses the contemporary physics, materials science, surface engineering issues, and nanotechnology capabilities of cluster beam processing.

Written by the originator of the gas cluster ion beam (GCIB) concept, this book:

  • Offers an overview of ion beam technologies, from the discovery of monomer ions to the introduction of GCIBs
  • Explores the development of sources for producing cluster beams from solid materials
  • Describes the engineering characteristics of gas cluster ion beam equipment
  • Covers cluster ion-solid surface interaction kinetics as well as sputtering, implantation, and ion-assisted deposition
  • Details surface processing techniques for smoothing, shallow implantation, and preparation of high-quality thin films
  • Introduces representative examples of emerging GCIB industrial applications

Materials Processing by Cluster Ion Beams: History, Technology, and Applications provides a deeper understanding of the importance of cluster ion beams and their applications.

商品描述(中文翻譯)

《聚集離子束材料處理:歷史、技術與應用》討論了聚集束處理的當代物理學、材料科學、表面工程問題以及納米技術能力。

本書由氣體聚集離子束(GCIB)概念的創始人撰寫,內容包括:

- 提供離子束技術的概述,從單體離子的發現到GCIB的引入
- 探討從固體材料中產生聚集束的源頭發展
- 描述氣體聚集離子束設備的工程特性
- 涵蓋聚集離子與固體表面相互作用的動力學,以及濺射、植入和離子輔助沉積
- 詳細介紹平滑處理、淺層植入和高品質薄膜製備的表面處理技術
- 介紹新興GCIB工業應用的代表性範例

《聚集離子束材料處理:歷史、技術與應用》提供了對聚集離子束及其應用重要性的更深入理解。