Physical Deposition Methods for Films and Coatings
暫譯: 薄膜與塗層的物理沉積方法

Comprehensive resource on the subject of deposition techniques for films and coatings and their characterization

Physical Deposition Methods for Films and Coatings presents a pedagogical compilation of current knowledge of dry deposition.

Written by a renowned and awarded academic with more than 40 years of experience in the field, Physical Deposition Methods for Films and Coatings covers topics including:

• The process of making a deposit that appears on the surface, growth of deposits, their post treatments, and characterization methods
• Different physical and chemical deposition techniques including atomistic, chemical vapor, and various thermal spraying methods
• Properties of deposits depending on the material and deposition technique
• Substrate preparation, coating microstructure, and morphology and stability of thin films
• Examples of applications of thin films in optical devices, environmental applications, telecommunications devices, and energy storage devices

Physical Deposition Methods for Films and Coatings is an essential reference on the subject for professionals and researchers in surface treatment and graduate students in related programs of study.