Handbook of Thin Film Deposition, Fourth Edition
暫譯: 薄膜沉積手冊(第四版)

  • 出版商: William Andrew
  • 出版日期: 2018-02-27
  • 售價: $7,180
  • 貴賓價: 9.5$6,821
  • 語言: 英文
  • 頁數: 470
  • 裝訂: Paperback
  • ISBN: 0128123117
  • ISBN-13: 9780128123119
  • 海外代購書籍(需單獨結帳)

相關主題

商品描述

Handbook of Thin Film Deposition, Fourth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, materials for memory applications and methods for thin film optical processes. The book is broken up into three sections: scaling, equipment and processing, and applications. In this newly revised edition, the handbook will also explore the limits of thin film applications, most notably as they relate to applications in manufacturing, materials, design and reliability.

  • Offers a practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance, applications and the limitations faced by those processes
  • Covers core processes and applications in the semiconductor industry and new developments within the photovoltaic and optical thin film industries
  • Features a new chapter discussing Gates Dielectrics

商品描述(中文翻譯)

《薄膜沉積手冊(第四版)》是一本全面的參考書,專注於半導體產業及其相關領域中使用的薄膜技術和應用,包括薄膜沉積、薄膜微觀特性、光伏太陽能應用、記憶體材料及薄膜光學過程的方法。本書分為三個部分:縮放、設備與處理,以及應用。在這一新修訂版中,手冊還將探討薄膜應用的限制,特別是與製造、材料、設計和可靠性相關的應用。

- 提供針對工程師和管理人員的薄膜技術實用調查,涵蓋過程的各個階段:設計、製造、質量保證、應用及這些過程所面臨的限制
- 涵蓋半導體產業的核心過程和應用,以及光伏和光學薄膜產業的新發展
- 特別新增一章討論閘極介電材料