Microlithography: Science and Technology
暫譯: 微影技術：科學與技術
Smith, Bruce W., Suzuki, Kazuaki
- 出版商: CRC
- 出版日期: 2020-05-20
- 售價: $6,820
- 貴賓價: 9.5 折 $6,479
- 語言: 英文
- 頁數: 838
- 裝訂: Hardcover - also called cloth, retail trade, or trade
- ISBN: 1439876754
- ISBN-13: 9781439876756
海外代購書籍(需單獨結帳)
商品描述
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world's leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved.
New in the Third Edition
In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography.
The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition.
Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
商品描述(中文翻譯)
完全修訂的第三版暢銷書《微影技術：科學與技術》提供了理論與操作考量的平衡處理，涵蓋從基本原則到納米尺度微影的進階主題。本書分為幾個章節，涵蓋與影像、材料及過程相關的所有重要方面，這些都是推動半導體微影技術邁向納米級世代所必需的。來自全球領先學術和工業組織的知名專家對光學、深紫外（DUV）、浸沒式、多重圖案、極紫外（EUV）、無掩模、納米壓印及定向自組裝微影技術所涉及的技術進行了深入的探討，並全面描述了相關的先進材料和過程。
第三版的新內容
除了對現有章節進行全面修訂外，這一新第三版還涵蓋了過去幾年出現的技術，包括多重圖案微影、製造設計、設計過程技術共同優化、無掩模微影和定向自組裝。書中還涵蓋了微影建模的新進展，以及詳細更新的資訊，介紹光學紫外、DUV、浸沒式和EUV微影的新技術、系統、材料和過程。
《微影技術：科學與技術》第三版權威地涵蓋了最新一代微影技術所涉及的科學與工程，並展望未來的系統和技術，這些將使下一代技術得以實現。
本書充滿插圖、方程式、表格以及節省時間的最新技術參考，是任何人（從學生到資深專業人士）想要更好地理解微影科學與技術複雜世界的最全面和可靠的來源。
作者簡介
Bruce W. Smith is a Distinguished Professor of engineering at the Rochester Institute of Technology. He has been involved in teaching and research in microelectronic and microsystems engineering for over 35 years. His areas of research include semiconductor processing, deep ultraviolet (DUV), vacuum ultraviolet (VUV), immersion, and extreme ultraviolet (EUV) lithography, thin films, optics, and microelectronic materials. He has authored over 250 technical publications, given over 100 technical talks, and received over 25 patents, licensing his technology both nationally and internationally. He has worked extensively with individuals and organizations in the semiconductor industry, including industrial partners in the Semiconductor Research Corporation, SEMATECH, and the IMEC. He is the recipient of numerous teaching and research awards, including the Institute of Electrical and Electronics Engineers (IEEE) Technical Excellence Award, the American Vacuum Society (AVS) Excellence in Leadership Award, the Society for Photo-optical Instrumentation Engineers (SPIE) Research Mentoring Award, and the Rochester Institute of Technology Trustees Scholarship Award. He has also been inducted into the Rochester Institute of Technology Innovator Hall of Fame. Professor Smith is a Fellow of the Institute of Electrical and Electronics Engineers, the Optical Society of America, and the Society for Photo-optical Instrumentation Engineers.
Kazuaki Suzuki majored in plasma physics and X-ray astronomy in the University of Tokyo, Japan. He has been a project manager for developing new concept exposure tools at Nikon Corporation, such as the early-generation KrF excimer laser stepper, the first-generation KrF excimer laser scanner, the electron beam projection exposure system, and the full-field extreme ultraviolet scanner. He received his Ph. D. in Precision Engineering from the University of Tokyo about the system design of exposure tools for microlithography. He has authored and coauthored many papers in the field of exposure tool and related technologies, including advanced equipment control by using metrology data. He also holds numerous patents in the same field. In the first decade of this century, he was a member of the program committee of the Society for Photo-optical Instrumentation Engineers (SPIE) Microlithography and other international conferences such as Micro & Nano Engineering in Europe and the International Microprocesses and Nanotechnology Conference in Japan. He was one of the associate editors of Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) from 2002 to 2009. He moved to Tokyo Tech Academy for Convergence of Materials and Informatics at Tokyo Institute of Technology (Tokyo Tech) in March 2019.
作者簡介(中文翻譯)
布魯斯·W·史密斯（Bruce W. Smith）是羅切斯特理工學院（Rochester Institute of Technology）的工程學特聘教授。他在微電子和微系統工程的教學與研究方面已有超過35年的經驗。他的研究領域包括半導體製程、深紫外（DUV）、真空紫外（VUV）、浸沒式和極紫外（EUV）光刻、薄膜、光學及微電子材料。他已發表超過250篇技術出版物，進行超過100場技術演講，並獲得超過25項專利，並在國內外授權其技術。他與半導體產業的個人和組織有廣泛的合作，包括半導體研究公司（Semiconductor Research Corporation）、半導體技術協會（SEMATECH）和歐洲微電子中心（IMEC）的工業夥伴。他獲得了多項教學和研究獎項，包括電氣與電子工程師學會（IEEE）技術卓越獎、美國真空學會（AVS）領導卓越獎、光學儀器工程師學會（SPIE）研究指導獎，以及羅切斯特理工學院董事獎學金。他也被選入羅切斯特理工學院創新者名人堂。史密斯教授是電氣與電子工程師學會、光學學會（Optical Society of America）和光學儀器工程師學會的會士。
鈴木和明（Kazuaki Suzuki）在日本東京大學主修等離子體物理和X射線天文學。他曾擔任尼康公司（Nikon Corporation）新概念曝光工具的專案經理，開發早期的KrF氪氟激光步進機、第一代KrF氪氟激光掃描儀、電子束投影曝光系統以及全場極紫外掃描儀。他在東京大學獲得精密工程博士學位，研究主題為微光刻曝光工具的系統設計。他在曝光工具及相關技術領域發表和共同發表了許多論文，包括利用計量數據進行先進設備控制的研究。他在同一領域也擁有多項專利。在本世紀的第一個十年，他曾是光學儀器工程師學會（SPIE）微光刻及其他國際會議（如歐洲的微納工程會議和日本的國際微處理技術與納米技術會議）的程序委員會成員。他從2002年到2009年擔任《微/納米光刻、MEMS和MOEMS期刊》（Journal of Micro/Nanolithography, MEMS, and MOEMS，簡稱JM3）的副編輯。他於2019年3月轉至東京科技大學（Tokyo Institute of Technology，簡稱Tokyo Tech）材料與資訊融合學院。
