High-Resolution Electron Microscopy, 4/e (Hardcover)
暫譯: 高解析度電子顯微鏡學,第4版 (精裝本)

John C. H. Spence

  • 出版商: Oxford University
  • 出版日期: 2013-12-01
  • 售價: $1,860
  • 貴賓價: 9.8$1,823
  • 語言: 英文
  • 頁數: 432
  • 裝訂: Hardcover
  • ISBN: 0199668639
  • ISBN-13: 9780199668632
  • 下單後立即進貨 (約5~7天)

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商品描述

This new fourth edition of the standard text on atomic-resolution transmission electron microscopy (TEM) retains previous material on the fundamentals of electron optics and aberration correction, linear imaging theory (including wave aberrations to fifth order) with partial coherence, and multiple-scattering theory. Also preserved are updated earlier sections on practical methods, with detailed step-by-step accounts of the procedures needed to obtain the highest quality images of atoms and molecules using a modern TEM or STEM electron microscope. Applications sections have been updated - these include the semiconductor industry, superconductor research, solid state chemistry and nanoscience, and metallurgy, mineralogy, condensed matter physics, materials science and material on cryo-electron microscopy for structural biology. New or expanded sections have been added on electron holography, aberration correction, field-emission guns, imaging filters, super-resolution methods, Ptychography, Ronchigrams, tomography, image quantification and simulation, radiation damage, the measurement of electron-optical parameters, and detectors (CCD cameras, Image plates and direct-injection solid state detectors). The theory of Scanning transmission electron microscopy (STEM) and Z-contrast are treated comprehensively. Chapters are devoted to associated techniques, such as energy-loss spectroscopy, Alchemi, nanodiffraction, environmental TEM, twisty beams for magnetic imaging, and cathodoluminescence. Sources of software for image interpretation and electron-optical design are given.

商品描述(中文翻譯)

這本原子解析度透射電子顯微鏡(TEM)標準教材的新第四版保留了先前有關電子光學基礎和像差修正的內容,包括線性成像理論(涵蓋到第五階的波像差)及部分相干性,以及多重散射理論。更新的早期部分也被保留,詳細說明了使用現代 TEM 或 STEM 電子顯微鏡獲取原子和分子最高質量影像所需的步驟和程序。應用部分也已更新,包括半導體產業、超導體研究、固態化學和納米科學,以及冶金學、礦物學、凝聚態物理學、材料科學和結構生物學的冷凍電子顯微鏡相關材料。新增或擴展的部分包括電子全息術、像差修正、場發射槍、成像濾波器、超解析方法、Ptychography、Ronchigrams、斷層成像、影像量化與模擬、輻射損傷、電子光學參數的測量,以及檢測器(CCD 相機、影像板和直接注入固態檢測器)。掃描透射電子顯微鏡(STEM)和 Z-對比的理論也得到了全面的處理。章節專門討論相關技術,如能量損失光譜學、Alchemi、納米衍射、環境 TEM、用於磁成像的扭曲束和陰極發光。提供了影像解釋和電子光學設計的軟體來源。