Optical Inspection of Microsystems, Second Edition
暫譯: 微系統的光學檢測（第二版）
Osten, Wolfgang
- 出版商: CRC
- 出版日期: 2019-06-25
- 售價: $9,380
- 貴賓價: 9.5 折 $8,911
- 語言: 英文
- 頁數: 570
- 裝訂: Hardcover - also called cloth, retail trade, or trade
- ISBN: 1498779476
- ISBN-13: 9781498779470
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商品描述
Where conventional testing and inspection techniques fail at the microscale, optical techniques provide a fast, robust, noninvasive, and relatively inexpensive alternative for investigating the properties and quality of microsystems. Speed, reliability, and cost are critical factors in the continued scale-up of microsystems technology across many industries, and optical techniques are in a unique position to satisfy modern commercial and industrial demands.
Optical Inspection of Microsystems, Second Edition, extends and updates the first comprehensive survey of the most important optical measurement techniques to be successfully used for the inspection of microsystems. Under the guidance of accomplished researcher Wolfgang Osten, expert contributors from industrial and academic institutions around the world share their expertise and experience with techniques such as image processing, image correlation, light scattering, scanning probe microscopy, confocal microscopy, fringe projection, grid and moire techniques, interference microscopy, laser-Doppler vibrometry, digital holography, speckle metrology, spectroscopy, and sensor fusion technologies. They also examine modern approaches to data acquisition and processing, such as the determination of surface features and the estimation of uncertainty of measurement results. The book emphasizes the evaluation of various system properties and considers encapsulated components to increase quality and reliability. Numerous practical examples and illustrations of optical testing reinforce the concepts.
Supplying effective tools for increased quality and reliability, this book
- Provides a comprehensive, up-to-date overview of optical techniques for the measurement and inspection of microsystems
- Discusses image correlation, displacement and strain measurement, electro-optic holography, and speckle metrology techniques
- Offers numerous practical examples and illustrations
- Includes calibration of optical measurement systems for the inspection of MEMS
- Presents the characterization of dynamics of MEMS
商品描述(中文翻譯)
在傳統的測試和檢查技術在微觀尺度上失敗的地方，光學技術提供了一種快速、穩健、非侵入性且相對便宜的替代方案，用於研究微系統的特性和質量。速度、可靠性和成本是微系統技術在許多行業持續擴展的關鍵因素，而光學技術在滿足現代商業和工業需求方面具有獨特的優勢。
《微系統的光學檢查，第二版》擴展並更新了第一版對於成功用於微系統檢查的最重要光學測量技術的全面調查。在成就卓越的研究者Wolfgang Osten的指導下，來自全球工業和學術機構的專家貢獻者分享了他們在圖像處理、圖像相關、光散射、掃描探針顯微鏡、共焦顯微鏡、條紋投影、網格和莫爾技術、干涉顯微鏡、激光多普勒振動測量、數位全息術、散斑測量、光譜學和傳感器融合技術等方面的專業知識和經驗。他們還探討了數據獲取和處理的現代方法，例如表面特徵的確定和測量結果的不確定性估算。本書強調各種系統特性的評估，並考慮封裝元件以提高質量和可靠性。大量的實際例子和光學測試的插圖加強了這些概念。
本書提供有效的工具以提高質量和可靠性，具體包括：
- 提供微系統測量和檢查的光學技術的全面、最新概述
- 討論圖像相關、位移和應變測量、電光全息術和散斑測量技術
- 提供大量的實際例子和插圖
- 包括MEMS檢查的光學測量系統的校準
- 提出MEMS動態特性的表徵
作者簡介
Wolfgang Osten earned an MSc/Diploma in physics at Friedrich Schiller University Jena in 1979. From 1979 to 1984 he was a member of the Institute of Mechanics in Berlin, working in the field of experimental stress analysis and optical metrology. In 1983 he earned a PhD at the Martin Luther University Halle-Wittenberg for his thesis in the field of holographic interferometry. From 1984 to 1991 he was employed at the Central Institute of Cybernetics and Information Processes ZKI in Berlin, making investigations in digital image processing and computer vision. Between 1988 and 1991 he headed the Institute for Digital Image Processing at ZKI. From 1991 to 2002 he joined the Bremen Institute of Applied Beam Technology (BIAS) to establish and direct the Department of Optical 3D-Metrology. From September 2002 to October 2018 he was a full professor at the University of Stuttgart and director of the Institute for Applied Optics. From 2006 to 2010 he was the vice rector for research and technology transfer at Stuttgart University, and from 2015 to 2018 he was the vice chair of the university council. His research is focused on new concepts for industrial inspection and metrology by combining modern principles of optical metrology, sensor technology, and image processing. He directs special attention to the development of resolution-enhanced technologies for the investigation of micro- and nanostructures.
作者簡介(中文翻譯)
沃爾夫岡·奧斯滕（Wolfgang Osten）於1979年在耶拿的弗里德里希·席勒大學（Friedrich Schiller University Jena）獲得物理學碩士/文憑。從1979年到1984年，他是柏林機械學研究所（Institute of Mechanics in Berlin）的成員，專注於實驗應力分析和光學計量學。1983年，他因在全息干涉測量領域的論文獲得馬丁·路德大學哈雷-維滕貝格（Martin Luther University Halle-Wittenberg）的博士學位。從1984年到1991年，他在柏林的中央控制論與信息處理研究所（ZKI）工作，進行數位影像處理和計算機視覺的研究。在1988年至1991年間，他擔任ZKI數位影像處理研究所的所長。從1991年到2002年，他加入不來梅應用束技術研究所（Bremen Institute of Applied Beam Technology, BIAS），建立並主管光學三維計量學部門。自2002年9月到2018年10月，他擔任斯圖加特大學（University of Stuttgart）的全職教授及應用光學研究所所長。從2006年到2010年，他擔任斯圖加特大學的研究與技術轉移副校長，並在2015年至2018年間擔任大學理事會副主席。他的研究專注於通過結合現代光學計量學、感測技術和影像處理的新概念來進行工業檢測和計量學。他特別關注於微觀和納米結構研究的解析度增強技術的開發。
