MOS Interface Physics, Process and Characterization
Wang, Shengkai, Wang, Xiaolei
- 出版商: CRC
- 出版日期: 2024-01-29
- 售價: $2,420
- 貴賓價: 9.5 折 $2,299
- 語言: 英文
- 頁數: 162
- 裝訂: Quality Paper - also called trade paper
- ISBN: 103210628X
- ISBN-13: 9781032106281
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相關分類:
物理學 Physics
海外代購書籍(需單獨結帳)
相關主題
商品描述
The electronic device based on Metal Oxide Semiconductor (MOS) structure is the most important component of a large-scale integrated circuit and the key to achieving high performance devices. This book contains experimental examples focusing on MOS and will be a reference for academics and postgraduates in the field of microelectronics.
作者簡介
Shengkai Wang is a professor in the Institute of Microelectronics, Chinese Academy of Sciences. He received Ph.D. from the University of Tokyo in 2011 and has been engaged in Ge, III-V, SiC in MOS technology. He has published more than 100 papers and authorized 40+ patents.
Xiaolei Wang is a professor in the Institute of Microelectronics, Chinese Academy of Sciences. He received Ph.D. from the Institute of Microelectronics, Chinese Academy of Sciences in 2013 and has been engaged in Si/Ge based MOS technology. He has published more than 100 papers.
