Fundamentals of Modern VLSI Devices, 2/e (IE-Paperback)
暫譯: 現代 VLSI 裝置基礎, 第2版 (IE-平裝本)

Yuan Taur

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商品描述

●Two new chapters cover read and write operations of commonly used SRAM, DRAM and non-volatile memory arrays, in addition to silicon-on-insulator (SOI) devices
●18 useful appendices discuss topics such as spatial variation of quasi-Fermi potentials and power gain of a two-port network
●New homework exercises at the end of every chapter engage students with real-life problems and test their understanding

 

Learn the basic properties and designs of modern VLSI devices, as well as the factors affecting performance, with this thoroughly updated second edition. The first edition has been widely adopted as a standard textbook in microelectronics in many major US universities and worldwide. The internationally renowned authors highlight the intricate interdependencies and subtle trade-offs between various practically important device parameters, and provide an in-depth discussion of device scaling and scaling limits of CMOS and bipolar devices. Equations and parameters provided are checked continuously against the reality of silicon data, making the book equally useful in practical transistor design and in the classroom. Every chapter has been updated to include the latest developments, such as MOSFET scale length theory, high-field transport model and SiGe-base bipolar devices.

商品描述(中文翻譯)

●兩個新章節涵蓋了常用的SRAM、DRAM和非揮發性記憶體陣列的讀取和寫入操作,以及絕緣體上矽(SOI)設備
●18個有用的附錄討論了準費米位能的空間變化和雙端口網路的功率增益等主題
●每章結尾的新作業練習讓學生接觸現實生活中的問題,並測試他們的理解

學習現代VLSI設備的基本特性和設計,以及影響性能的因素,這是經過徹底更新的第二版。第一版已被許多美國主要大學和全球廣泛採用作為微電子學的標準教科書。國際知名的作者強調了各種實際重要設備參數之間的複雜相互依賴性和微妙的權衡,並深入討論了CMOS和雙極性設備的設備縮放及縮放限制。提供的方程式和參數不斷與矽數據的現實進行檢查,使本書在實際晶體管設計和課堂教學中同樣有用。每章都已更新以包含最新的發展,例如MOSFET尺度長度理論、高場傳輸模型和SiGe基雙極設備。