Silicon Germanium: Technology, Modeling, and Design (Hardcover)
暫譯: 矽鍺:技術、建模與設計(精裝版)
Raminderpal Singh, Modest M. Oprysko, David Harame
- 出版商: Wiley
- 出版日期: 2003-11-07
- 售價: $931
- 語言: 英文
- 頁數: 368
- 裝訂: Hardcover
- ISBN: 047144653X
- ISBN-13: 9780471446538
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商品描述
–Ron Wilson, EETimes
"SiGe technology has demonstrated the ability to provide excellent
high-performance characteristics with very low noise, at high power gain, and
with excellent linearity. This book is a comprehensive review of the technology
and of the design methods that go with it."
–Alberto
Sangiovanni-Vincentelli
Professor, University of California,
Berkeley
Cofounder, Chief Technology Officer, Member of Board
Cadence
Design Systems Inc.
Filled with in-depth insights and expert advice, Silicon Germanium covers all the key aspects of this technology and its applications. Beginning with a brief introduction to and historical perspective of IBM’s SiGe technology, this comprehensive guide quickly moves on to:
- Detail many of IBM’s SiGe technology development programs
- Explore IBM’s approach to device modeling and characterization–including predictive TCAD modeling
- Discuss IBM’s design automation and signal integrity knowledge and implementation methodologies
- Illustrate design applications in a variety of IBM’s SiGe technologies
- Highlight details of highly integrated SiGe BiCMOS system-on-chip (SOC) design
Written for RF/analog and mixed-signal designers, CAD designers, semiconductor students, and foundry process engineers worldwide, Silicon Germanium provides detailed insight into the modeling and design automation requirements for leading-edge RF/analog and mixed-signal products, and illustrates in-depth applications that can be implemented using IBM’s advanced SiGe process technologies and design kits.
"This volume provides an excellent introduction to the SiGe BiCMOS
technology, from the underlying device physics to current applications. But just
as important is the window the text provides into the infrastructure–the process
development, device modeling, and tool development."
–Ron Wilson
Silicon
Engineering Editor, EETimes
"This book chronicles the development of SiGe in detail, provides an in-depth
look at the modeling and design automation requirements for making advanced
applications using SiGe possible, and illustrates such applications as
implemented using IBM’s process technologies and design methods."
–John
Kelly
Senior Vice President and Group Executive, Technology Group, IBM
Table of Contents:
Contributors.
Foreword.
Preface.
Acknowledgments.
Introduction.
A Historical Perspective at IBM.
Technology Development.
Modeling and Characterization.
Design Automation and Signal Integrity.
Leading-Edge Applications.
Appendix.
Index.
About the Authors
商品描述(中文翻譯)
「這是一本對SiGe BiCMOS技術的優秀介紹,涵蓋了基礎的裝置物理學到當前的應用。」–Ron Wilson, EETimes
「SiGe技術已證明能夠提供卓越的高性能特性,具有非常低的噪聲、高功率增益和優異的線性度。本書是對該技術及其設計方法的全面回顧。」–Alberto Sangiovanni-Vincentelli
加州大學伯克利分校教授
Cadence Design Systems Inc. 共同創辦人、首席技術官、董事會成員
本書充滿深入的見解和專家建議,涵蓋了這項技術及其應用的所有關鍵方面。從對IBM的SiGe技術的簡要介紹和歷史背景開始,這本全面的指南迅速轉向:
- 詳細介紹IBM的SiGe技術開發計劃
- 探索IBM的裝置建模和特性化方法,包括預測性TCAD建模
- 討論IBM的設計自動化和信號完整性知識及實施方法
- 說明在各種IBM的SiGe技術中的設計應用
- 突出高度集成的SiGe BiCMOS系統單晶片(SOC)設計的細節
本書是為全球的RF/類比和混合信號設計師、CAD設計師、半導體學生和代工廠工藝工程師撰寫的,提供了對尖端RF/類比和混合信號產品的建模和設計自動化需求的詳細見解,並說明了可以使用IBM的先進SiGe工藝技術和設計工具包實現的深入應用。
「這本書提供了對SiGe BiCMOS技術的優秀介紹,涵蓋了基礎的裝置物理學到當前的應用。但同樣重要的是,文本提供了對基礎設施的窗口——工藝開發、裝置建模和工具開發。」–Ron Wilson
EETimes 硅工程編輯
「這本書詳細記錄了SiGe的發展,深入探討了使用SiGe實現先進應用所需的建模和設計自動化要求,並說明了使用IBM的工藝技術和設計方法實現的這些應用。」–John Kelly
IBM技術集團高級副總裁及集團執行官
**目錄:**
- 貢獻者
- 前言
- 序言
- 感謝詞
- 介紹
- IBM的歷史視角
- 技術開發
- 建模與特性化
- 設計自動化與信號完整性
- 尖端應用
- 附錄
- 索引
- 關於作者