Spectroscopy of Complex Oxide Interfaces: Photoemission and Related Spectroscopies
暫譯: 複雜氧化物介面的光譜學：光發射及相關光譜技術

本書總結了有關複雜氧化物界面的最新且引人注目的實驗結果。本書的結果是利用尖端的光發射技術在最高能量解析度下獲得的。由於其在新一代電子設備中的迷人特性以及研究埋藏區域的挑戰，本書主要集中於複雜氧化物界面。

探索埋藏界面的關鍵特徵是使用軟X射線角度解析光發射光譜（ARPES），其操作能量範圍為幾百電子伏特，以增加光電子的平均自由程，使光子能夠穿透頂層，這與傳統的紫外光（UV）-ARPES技術形成對比。本書中呈現的結果是由全球不同研究團隊獲得的，並以清晰的結構進行總結，並與其他光發射光譜技術及其他氧化物材料進行比較討論。這些結果得到了最新理論計算的補充和支持，以及包括電子傳輸和非彈性共振X射線散射等互補實驗技術的結果。

Claudia Cancellieri has the following Professional Experience and Education: (2014-present) She is a Research Scientist at the Laboratory for Joining Technologies and Corrosion, EMPA, Dübendorf, Switzerland. Her research interests include Surface analysis and growth of oxides on metals and study of metallic nanomultilayers. (2011-2014) She completed her Post-Doctoral Fellowship in Surface X-Ray Diffraction Station, Materials Science Beamline at the Swiss Light Source (SLS), Paul Scherrer Institut (PSI), Villigen, Switzerland, under the title "Study of the structure and electronic properties of complex-oxide interfaces grown by laser ablation for transistors and electronic devices applications." (2008-2011) She completed her Post-Doctoral Fellowship in the Department of Condensed Matter Physics, University of Geneva, Switzerland, which includes Research on complex oxide interfaces, field-effect devices, Study of the growth by laser ablation and electronic characterization of complex oxides, and Study of the interface properties: magnetotransport, x-ray diffraction, superconductivity, and topography. (2004-2008) She received her PhD in Physics, Ecole Polytechnique Fédérale de Lausanne (EPFL), Lausanne, Switzerland, Thesis title: "Photoemission and electronic properties of thin (strained) cuprate films by laser ablation heteroepitaxy." Her areas of interest include Research on thin films of superconducting materials, Construction and optimization of a new Pulsed Laser Deposition (PLD) system for thin-film growth linked to a photoemission chamber for in-situ Angle-Resolved Photoemission Spectroscopy (ARPES) electronic analysis and Study of structural, electronic and superconducting properties of La2-xSr2CuO4 thin films under epitaxial strain. (2003-2004) She did her Diploma thesis work (Master of Science) at the ENEA Frascati Research Center in Frascati, Rome, Italy, Title: "Deposition and characterization of Ca-doped YBa₂Cu₃O₇ - epitaxial thin films." The work focused on the effect of oxygen on the superconducting and structural properties of the films changed by the post-annealing treatment. She obtained Laurea diploma in February 2004 with a grade of 110/110 cum laude. (1998-2004) She received a University degree in Physics from Università degli Studi di Milano, Milan, Italy, with Major in solid-state physics and superconductivity. Her scientific skills include: Thin film growth, Research on high-temperature superconducting thin films and oxide materials: extensive experience in thin-film heteroepitaxial growth by pulsed laser deposition (excimer and Nd: YAG laser) and Electrochemical anodization of metals.

Dr. Vladimir N. Strocov graduated from St. Petersburg State University, Russia in 1986 and obtained his PhD degree there in 1990 with specialization in solid-state physics. His further experimental and theoretical research in a number of European institutions (Chalmers University of Technology, Sweden, University of Augsburg, Germany etc.) focused on photoelectron and very-low-energy electron diffraction spectroscopies applied to a wide range of solid-state systems ranging from bulk to nanomaterials. He obtained his habilitation degree in 2000 with the Institute for Analytic Instrumentation in St. Petersburg, Russia. His present activity at the Swiss Light Source since 2004 extends from the development of synchrotron radiation instrumentation to research on various bulk and nanostructure solid-state systems with different electron correlation strengths using soft X-ray photoelectron spectroscopy and related techniques. He has more than 125 publications in refereed journals and monographs, including 24 publications in Physical Review Letters, 6 in the Nature journals and 3 invited reviews, and has been a guest editor in a number of topical journal issues.

克勞迪亞·坎切利耶里（Claudia Cancellieri）擁有以下的專業經驗和教育背景：（2014年至今）她是瑞士杜本多夫EMPA連接技術與腐蝕實驗室的研究科學家。她的研究興趣包括金屬表面分析及氧化物生長，以及金屬納米多層的研究。（2011-2014）她在瑞士光源（SLS）保羅·謝爾研究所（PSI）材料科學光束線的表面X射線衍射站完成了博士後研究，研究題目為「激光脫附生長的複雜氧化物界面的結構和電子特性研究，應用於晶體管和電子設備。」（2008-2011）她在瑞士日內瓦大學凝聚態物理系完成了博士後研究，研究內容包括複雜氧化物界面、場效應器件、激光脫附生長及複雜氧化物的電子特性研究，以及界面特性研究：磁輸運、X射線衍射、超導性和拓撲學。（2004-2008）她在瑞士洛桑聯邦理工學院（EPFL）獲得物理學博士學位，論文題目為「激光脫附異質外延薄膜的薄（應變）銅酸鹽薄膜的光電子發射和電子特性。」她的研究領域包括超導材料薄膜的研究、新型脈衝激光沉積（PLD）系統的建設和優化，該系統用於薄膜生長並連接到光電子發射室進行原位角分辨光電子發射光譜（ARPES）電子分析，以及在外延應變下La2-xSr2CuO4薄膜的結構、電子和超導性質研究。（2003-2004）她在意大利羅馬的ENEA弗拉斯卡蒂研究中心完成了碩士論文，題目為「Ca摻雜YBa₂Cu₃O₇的沉積和表徵 - 外延薄膜。」該研究集中於氧氣對薄膜超導性和結構特性的影響，這些特性因後退火處理而改變。她於2004年2月獲得Laurea學位，成績為110/110 cum laude。（1998-2004）她在意大利米蘭大學獲得物理學學位，主修固態物理和超導性。她的科學技能包括：薄膜生長、高溫超導薄膜和氧化物材料的研究：在脈衝激光沉積（氟化氬和Nd:YAG激光）和金屬的電化學陽極氧化方面擁有豐富的經驗。

弗拉基米爾·N·斯特羅科夫（Dr. Vladimir N. Strocov）於1986年畢業於俄羅斯聖彼得堡國立大學，並於1990年獲得固態物理專業的博士學位。他在多個歐洲機構（如瑞典查爾默斯科技大學、德國奧格斯堡大學等）進行的進一步實驗和理論研究，專注於應用於各種固態系統的光電子和超低能量電子衍射光譜學，範圍從塊材料到納米材料。他於2000年在俄羅斯聖彼得堡的分析儀器研究所獲得了資格認證學位。自2004年以來，他在瑞士光源的工作範圍從同步輻射儀器的開發擴展到使用軟X射線光電子光譜學及相關技術研究各種具有不同電子相關強度的塊狀和納米結構固態系統。他在同行評審的期刊和專著中發表了超過125篇論文，包括24篇發表在《物理評論快報》、6篇發表在《自然》期刊和3篇邀請評論，並在多個專題期刊中擔任客座編輯。