III-Nitride Devices and Nanoengineering (III-氮化物裝置與奈米工程)

Devices, nanoscale science and technologies based on GaN and related materials, have achieved great developments in recent years. New GaN-based devices such as UV detectors, fast p-HEMT and microwave devices are developed far more superior than other semiconductor materials-based devices.

Written by renowned experts, the review chapters in this book cover the most important topics and achievements in recent years, discuss progress made by different groups, and suggest future directions. Each chapter also describes the basis of theory and experiment.

This book is an invaluable resource for device design and processing engineers, material growers and evaluators, postgraduates and scientists as well as newcomers in the GaN field.

Contents: High Pressure Bulk Crystal Growth of (Ga,Al)N (P Geiser et al.); Fabrication of GaN Light Emitting Diodes by Laser-Off Technique (C-F Chu et al.); High-Resolution Electron Microscopy Observations of GaN-Based Laser Diodes (M Shiojiri); Growth and Development of III-Nitride Photodetectors (U Chowdhury et al.); Laser Diodes Grown on Bulk GaN Substrate (P Perlin et al.); III-Nitride Lighting Emitting Diodes on Si (N C Chen & C F Shih); III-Nitride Light-Emitting Devices on Patterned Sapphire Substrates (D S Wuu et al.); Recent Trends in Indium Nitride Nanomaterials (A Ganguly et al.); and other papers.