Through-Silicon Vias for 3D Integration (Hardcover)
暫譯: 3D整合的穿矽通孔

John H. Lau

  • 出版商: McGraw-Hill Education
  • 出版日期: 2012-10-11
  • 售價: $6,050
  • 貴賓價: 9.5$5,748
  • 語言: 英文
  • 頁數: 512
  • 裝訂: Hardcover
  • ISBN: 0071785140
  • ISBN-13: 9780071785143
  • 海外代購書籍(需單獨結帳)

買這商品的人也買了...

商品描述

A comprehensive guide to TSV and other enabling technologies for 3D integration

Written by an expert with more than 30 years of experience in the electronics industry, Through-Silicon Vias for 3D Integration provides cutting-edge information on TSV, wafer thinning, thin-wafer handling, microbumping and assembly, and thermal management technologies. Applications to highperformance, high-density, low-power-consumption, wide-bandwidth, and small-form-factor electronic products are discussed.

This book offers a timely summary of progress in all aspects of this fascinating field for professionals active in 3D integration research and development, those who wish to master 3D integration problem-solving methods, and anyone in need of a low-power, wide-bandwidth design and high-yield manufacturing process for interconnect systems.

Coverage includes:

  • Nanotechnology and 3D integration for the semiconductor industry
  • TSV etching, dielectric-, barrier-, and seed-layer deposition, Cu plating, CMP, and Cu revealing
  • TSVs: mechanical, thermal, and electrical behaviors
  • Thin-wafer strength measurement
  • Wafer thinning and thin-wafer handling
  • Microbumping, assembly, and reliability
  • Microbump electromigration
  • Transient liquid-phase bonding: C2C, C2W, and W2W
  • 2.5D IC integration with interposers
  • 3D IC integration with interposers
  • Thermal management of 3D IC integration
  • 3D IC packaging

 

商品描述(中文翻譯)

3D 整合的 TSV 及其他啟用技術綜合指南

本書由一位在電子產業擁有超過 30 年經驗的專家撰寫,Through-Silicon Vias for 3D Integration 提供有關 TSV、晶圓薄化、薄晶圓處理、微凸點及組裝、以及熱管理技術的前沿資訊。書中討論了應用於高效能、高密度、低功耗、寬頻寬及小型化電子產品的相關技術。

本書為活躍於 3D 整合研究與開發的專業人士、希望掌握 3D 整合問題解決方法的人士,以及需要低功耗、寬頻寬設計和高良率製造流程的互連系統需求者,提供了及時的進展總結。

內容涵蓋:


  • 半導體產業的奈米技術與 3D 整合

  • TSV 蝕刻、介電層、阻隔層及種子層沉積、銅電鍍、化學機械平坦化 (CMP) 及銅顯露

  • TSV 的機械、熱及電氣特性

  • 薄晶圓強度測量

  • 晶圓薄化及薄晶圓處理

  • 微凸點、組裝及可靠性

  • 微凸點電遷移

  • 瞬態液相鍵合:C2C、C2W 及 W2W

  • 使用中介層的 2.5D IC 整合

  • 使用中介層的 3D IC 整合

  • 3D IC 整合的熱管理

  • 3D IC 封裝