Nanoscale CMOS VLSI Circuits: Design for Manufacturability (Hardcover)
暫譯: 納米尺度 CMOS VLSI 電路：可製造性設計 (精裝版)

Sandip Kundu, Aswin Sreedhar

Nanoscale CMOS VLSI Circuits: Design for Manufacturability (Hardcover)
  • 出版商: McGraw-Hill Education
  • 出版日期: 2010-07-15
  • 定價: $1,980
  • 售價: 9.0 折 $1,782
  • 語言: 英文
  • 頁數: 316
  • 裝訂: Hardcover
  • ISBN: 007163519X
  • ISBN-13: 9780071635196
  • 相關分類: CMOS、VLSI

    • 立即出貨 (庫存 < 3)

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商品描述

Cutting-Edge CMOS VLSI Design for Manufacturability Techniques

This detailed guide offers proven methods for optimizing circuit designs to increase the yield, reliability, and manufacturability of products and mitigate defects and failure. Covering the latest devices, technologies, and processes, Nanoscale CMOS VLSI Circuits: Design for Manufacturability focuses on delivering higher performance and lower power consumption. Costs, constraints, and computational efficiencies are also discussed in the practical resource.

Nanoscale CMOS VLSI Circuits covers:

  • Current trends in CMOS VLSI design
  • Semiconductor manufacturing technologies
  • Photolithography
  • Process and device variability: analyses and modeling
  • Manufacturing-Aware Physical Design Closure
  • Metrology, manufacturing defects, and defect extraction
  • Defect impact modeling and yield improvement techniques
  • Physical design and reliability
  • DFM tools and methodologies

商品描述(中文翻譯)

切割尖端的 CMOS VLSI 可製造性設計技術

本詳細指南提供了經過驗證的方法，以優化電路設計，增加產品的良率、可靠性和可製造性，並減少缺陷和故障。涵蓋最新的設備、技術和流程，Nanoscale CMOS VLSI Circuits: Design for Manufacturability 專注於提供更高的性能和更低的功耗。實用資源中還討論了成本、限制和計算效率。

Nanoscale CMOS VLSI Circuits 涵蓋：
- CMOS VLSI 設計的當前趨勢
- 半導體製造技術
- 光刻技術
- 流程和設備變異性：分析和建模
- 考慮製造的物理設計收斂
- 測量學、製造缺陷和缺陷提取
- 缺陷影響建模和良率改善技術
- 物理設計和可靠性
- DFM 工具和方法論

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